What are the components and uses of photoresist?
2021-08-23
1. Photoresist definition
Photoresist is a kind of polymer material with photosensitive chemistry (or sensitive to electron energy), which is a medium for transferring patterns of ULTRAVIOLET exposure or electron beam exposure. The English name of photoresist is resist, which is also translated as resist, photoresist, etc. The role of photoresist is to protect the substrate surface as an etch-resistant layer. Photoresist is just a figurative term, because photoresist appears to be a gelatinous liquid.
Photoresist is usually uniformly covered on the substrate in the form of a thin film. When ultraviolet light or electron beam irradiation, the characteristics of the photoresist material itself changes, after solution development, negative photoresist exposure of positive photoresist exposure or not will stay at the surface of the substrate, so that it will design the micro-nano structure transfer onto the photoresist, and the subsequent etching and deposition process, it can further this pattern is transferred to the substrate under the photoresist, Finally, the photoresist can be removed by using a gel remover.
2. Photoresist application range
Photoresist is widely used in integrated circuit (IC), Packaging (Packaging), microelectromechanical system (MEMS), optoelectronic devices photonic devices (Optoelectronics/Photonics), flat panel display (LED, LCD, OLED), Solar photovoltaic (Solar PV), and other fields.
3. Photoresist composition
Photoresist generally consists of four parts: resin polymer (resin/polymer), solvent (solvent), photoactive compound (PAC), Additive (Additive). Among them, resin polymer is the main body of photoresist, it makes photoresist has etching resistance; The solvent keeps the photoresist in a liquid state for easy coating; Photoactive substance is to control the photoresist to a specific wavelength of light/electron beam/ion beam/X-ray, and the corresponding chemical reaction; Additives are used to change certain properties of photoresist, such as controlling the light absorption/solubility of the glue.
(2) Resolution
(3) Contrast
(4) viscosity/viscosity
(5) Corrosion resistance
(6) Process tolerance
Photoresist is a kind of polymer material with photosensitive chemistry (or sensitive to electron energy), which is a medium for transferring patterns of ULTRAVIOLET exposure or electron beam exposure. The English name of photoresist is resist, which is also translated as resist, photoresist, etc. The role of photoresist is to protect the substrate surface as an etch-resistant layer. Photoresist is just a figurative term, because photoresist appears to be a gelatinous liquid.
Photoresist is usually uniformly covered on the substrate in the form of a thin film. When ultraviolet light or electron beam irradiation, the characteristics of the photoresist material itself changes, after solution development, negative photoresist exposure of positive photoresist exposure or not will stay at the surface of the substrate, so that it will design the micro-nano structure transfer onto the photoresist, and the subsequent etching and deposition process, it can further this pattern is transferred to the substrate under the photoresist, Finally, the photoresist can be removed by using a gel remover.
2. Photoresist application range
Photoresist is widely used in integrated circuit (IC), Packaging (Packaging), microelectromechanical system (MEMS), optoelectronic devices photonic devices (Optoelectronics/Photonics), flat panel display (LED, LCD, OLED), Solar photovoltaic (Solar PV), and other fields.
3. Photoresist composition
Photoresist generally consists of four parts: resin polymer (resin/polymer), solvent (solvent), photoactive compound (PAC), Additive (Additive). Among them, resin polymer is the main body of photoresist, it makes photoresist has etching resistance; The solvent keeps the photoresist in a liquid state for easy coating; Photoactive substance is to control the photoresist to a specific wavelength of light/electron beam/ion beam/X-ray, and the corresponding chemical reaction; Additives are used to change certain properties of photoresist, such as controlling the light absorption/solubility of the glue.
4. Factors affecting photoresist
(1) Sensitivity(2) Resolution
(3) Contrast
(4) viscosity/viscosity
(5) Corrosion resistance
(6) Process tolerance
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OLED Material Photoresist: What is That?