Photoresist special chemicals belong to the upstream industry of photoresist preparation. Its basic components are as follows: photoinitiator (photosensitizer, photoacid producing agent), solvent, film forming resin and additive (auxiliary agent, monomer, etc.). Taking the mass proportion of each component of ArF photoresist as an example, its film-forming resin accounted for 5-15%, photoinitiator accounted for 0.05-10%, other additives accounted for 0.01-2%, solvent accounted for 73-95%.



According to industry research investigation, and global photoresist light initiator and monomer, solvents, film forming resin, the main production enterprises, a total of 44 on the photoresist specialty chemicals mainly classified them according to belong to enterprise, it is concluded that these raw materials manufacturing enterprises located in Japan, the United States, China, South Korea, Britain and the Netherlands. Among them, the number of enterprises based in Japan is the largest, accounting for 49% of the world's photolithographic collagen material production enterprises.

Although the number of Chinese enterprises accounts for 29%, the output and scale of each enterprise in photoresist chemicals are small, and the variety and specification are relatively single, while foreign enterprises have great advantages in production scale and product variety and specification, and the coverage is wider.